| PRODUCT NAME |
A Method Of Producing Silicon Nanowire
|
| ABSTRACT |
A method of producing a silicon-based nanowire comprising the steps of patterning a resist layer deposited on a silicon-on-insulator; wet-etching the SOInwith the resist layer using an anisotropic solution to form a riffle structure; removing the resist layer; thermally oxidizing the SOI; and repeating steps to trim down the riffle structure to nanoscale.
|
| FILING COUNTRY |
Malaysia
|
| REG. NUMBER |
PI 2014703284
|
| INTELLECTUAL STATUS |
Patent Filing
|
| FILE DATE |
5/11/2014
|
| IP TYPE |
Patent
|
| YEAR APPLY |
2014
|
| DEPARTMENT |
NANO
|
| STAF NO / MATRIC NO |
UDA BIN HASHIM, 640330-02-5389, 0402428
|
| OWNER NAME |
UNIMAP
|
| EQUITY PERCENTAGE |
|
| NOTEL HP |
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