| ABSTRACT |
The present invention relates to a method of fabrication of nanogap electrodes using size reduction technique for DNA detection. Two photo mask are employed to fabricate the nanogap using photolithography technique. The first photo mask for nanogap electrode formation is designed with length and width of 5000um and 2500um respectively and wherein angle length of the end electrode is taken sixth scale start from 100um until 1100um and increase by 100um for each side angle length.
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