| ABSTRACT |
The conventional photolithography of crystalline silicon techniques is limited to two-dimensional and structure scaling. This can be overcome by using laser micromachine, a technique capable of producing three-dimensional structure and simultaneously avoiding the needs for photomasks. In this research product, we report on the use of RapidX-250 excimer laser micromachine with 248 nm KrF to create in time mask design and assisting in the fabrication of microcantilever structure. By using micromachining process, the average process time is decrease due to less number of processes needed. In cantilever formation, the machining geometries are programmable using BOBCAD drawing file and convert it to G-code for machine automation. This process will eliminate the existing of cantilever photo mask in the photolithography process.
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